Sputtering Target Market Trend Analysis And Forecasts to 2027
The global Sputtering Target market gathered revenue around USD 6.0 Billion by the end of 2027 and is estimated to expand at a modest CAGR of 5% during the prediction period 2021 to 2027.
Report Coverage
| Report Highlights | Details |
| Market Size | USD 6.0 Billion by 2027 |
| Growth Rate | CAGR of 5% From 2021 to 2027 |
| Base Year | 2020 |
| Forecast Period | 2021 to 2027 |
| Historic Data | 2017 to 2020 |
| Report coverage | Growth Factors, Revenue Status, Competitive Landscape, and Future Trends |
| Segments Covered | by Application, Type, by Material, and Region |
| Regional Scope | North America, Europe, Asia Pacific, Latin America, Middle East & Africa (MEA) |
| Companies Mentioned | Honeywell International, Inc., Heraeus Holding GmbH, Hitachi Metals, JX Nippon Mining & Metals Corporation, Kamis Incorporated, Konfoong Materials International Co., Ltd., Buhler Leybold Optics, Matsurf Technologies Inc., Mitsubishi Corporation, Praxair International, Inc., Sumitomo Chemicals Co., Ltd., Testbourne Ltd., Tosoh Corporation, ULVAC, Inc., and Vacuum Engineering and Materials Co. |
The global sputtering target market is broadly affected by several factors, including increase in the adoption of sputtering target in solar panels.
sputtering target in coating solar cell, increase in demand for sputtering targets in the automobile industry, and surge in the demand from consumer electronics are expected to boost the global sputtering target market during the forecast period
This research report purposes at stressing the most lucrative growth prospects. The aim of the research report is to provide an inclusive valuation of the Sputtering Target market and it encompasses thoughtful visions, actualities, industry-validated market findings, historic data, and prognoses by means of appropriate set of assumptions and practice. Global Sputtering Target market report aids in comprehending market structure and dynamics by recognizing and scrutinizing the market sectors and predicted the global market outlook.
COVID-19 Impact Assessment on Market Landscape
The report comprises the scrutiny of COVID-19 lock-down impact on the income of market leaders, disrupters and followers. Since lock down was instigated differently in diverse regions and nations, influence of same is also dissimilar across various industry verticals. The research report offers present short-term and long-term influence on the market to assist market participants across value chain makers to formulate the framework for short term and long-lasting tactics for recovery and by region.
Sputtering Target market report empower readers with all-inclusive market intelligence and offers a granular outline of the market they are operational in. Further this research study delivers exceptional combination of tangible perceptions and qualitative scrutiny to aid companies accomplishes sustainable growth. This report employs industry-leading research practices and tools to assemble all-inclusive market studies, intermingled with pertinent data. Additionally, this report also emphases on the competitive examination of crucial players by analyzing their product portfolio, pricing, gross margins, financial position, growth approaches, and regional occurrence.
Sputtering Target Market: Dynamics
Sputtering target is a new type of coating material (compared to evaporation materials) that is critical for thin-film solar cell coatings in the solar industry.
A thin-film solar cell is a second-generation solar cell that is made by depositing one or more thin layers, or thin-film (TF) of photovoltaic material on a substrate, such as glass, plastic, or metal. Sputtering targets are important source materials in the deposition process. CdTe (cadmium telluride) sputtering target, CIGS (copper indium gallium diselenide) sputtering target, and silicon sputtering target are used in the solar cell thin-film coating.
Competitive Rivalry
Foremost players in the market are attentive on adopting corporation strategies to enhance their market share. Some of the prominent tactics undertaken by leading market participants in order to sustain the fierce market completion include collaborations, acquisitions, substantial spending in R&D and the improvement of new-fangled products or reforms among others.
Major manufacturers & their revenues, percentage splits, market shares, growth rates and breakdowns of the product markets are determined through secondary sources and verified through the primary sources.
Some of the prominent players in the Sputtering Target Market include: Honeywell International, Inc., Heraeus Holding GmbH, Hitachi Metals, JX Nippon Mining & Metals Corporation, Kamis Incorporated, Konfoong Materials International Co., Ltd., Buhler Leybold Optics, Matsurf Technologies Inc., Mitsubishi Corporation, Praxair International, Inc., Sumitomo Chemicals Co., Ltd., Testbourne Ltd., Tosoh Corporation, ULVAC, Inc., and Vacuum Engineering and Materials Co.
Unravelling the Critical Segments
This research report offers market revenue, sales volume, production assessment and prognoses by classifying it on the basis of various aspects including product type, application/end-user, and region. Further, this research study investigates market size, production, consumption and its development trends at global, regional, and country level for period 2017 to 2027 and covers subsequent region in its scope:
Sputtering Target Market: Segmentation
Sputtering Target Market, by Application
Sputtering Target Market, by Type
Sputtering Target Market, by Material
By Geography
North America
Europe
Asia Pacific
Latin America
Middle East & Africa (MEA)
Highlights of the Report:
Research Methodology
In the study, a unique research methodology is utilized to conduct extensive research on the growth of the Sputtering Target market, and reach conclusions on the future growth parameters of the market. This research methodology is a combination of primary and secondary research, which helps analysts ensure the accuracy and reliability of the conclusions.
Secondary resources referred to by analysts during the production of the Sputtering Target market study are as follows - statistics from government organizations, trade journals, white papers, and internal and external proprietary databases. Analysts have also interviewed senior managers, product portfolio managers, CEOs, VPs, marketing/product managers, and market intelligence managers, all of whom have contributed to the development of this report as a primary resource.
Comprehensive information acquired from primary and secondary resources acts as a validation from companies in the market, and makes the projections on the growth prospects of the Sputtering Target markets more accurate and reliable.
Secondary Research
It involves company databases such as Hoover's: This assists us recognize financial information, structure of the market participants and industry competitive landscape.
The secondary research sources referred in the process are as follows:
Primary Research
Primary research includes face-to face interviews, online surveys, and telephonic interviews.
Industry participants involved in this research study include:
Key Points Covered in Sputtering Target market Study:
Cross-segment Market Size and Analysis for Mentioned Segments
Additional Company Profiles
(Upto 5 With No Cost)
Additional Countries (Apart
From Mentioned Countries)
Country/Region-specific Report
Go To Market Strategy
Region Specific Market DynamicsRegion Level Market Share Import Export AnalysisProduction AnalysisOthers